Metal working – Barrier layer or semiconductor device making
Patent
1992-11-19
1993-06-29
Bueker, Richard
Metal working
Barrier layer or semiconductor device making
414217, 156345, 20429825, 118719, C23C 1600
Patent
active
052230015
ABSTRACT:
The present invention is a vacuum processing apparatus provided with a vacuum processing chamber which implements a required processing to an object of processing, and a pre-vacuum chamber (load-lock chamber) configured so that it can be internally vacuum exhausted, with an object of processing being carried-in and -out of the vacuum processing chamber via the pre-vacuum chamber, in which a small space which can be airtightly sealed is provided inside the pre-vacuum chamber, so that the object of processing can be temporarily withdrawn into and housed in the small space when there is vacuum exhaust from the pre-vacuum chamber and when there is the introduction of air to the pre-vacuum chamber. Thus, it is possible to prevent the adhesion to the processing object of particles which rise when air is introduced to the load-lock chamber and when air is exhausted from the load-lock chamber, and without having to perform slow exhaust and slow venting, while increases the throughput and the yield at the same time.
REFERENCES:
patent: 4824545 (1989-04-01), Arnold
patent: 4828224 (1989-05-01), Crabb
patent: 5084125 (1992-01-01), Aoi
patent: 5139459 (1992-08-01), Takahashi
Bueker Richard
Tokyo Electron Kabushiki Kaisha
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