Vacuum processing apparatus

Details Vacuum processing apparatus Vacuum processing apparatus

1997-02-25

1999-09-14

Nguyen, Nam

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20419213, 20429807, 118663, 118712, C23C 1454

Patent

active

059518340

ABSTRACT:
A vacuum processing apparatus includes a process chamber capable of being evacuated and a gas quantity detector for outputting a gas quantity signal corresponding to a partial pressure of each kind of gas contained in the process chamber. The gas quantity detector has a detection sensitivity set in response to a sensitivity calibration signal externally supplied and generates the gas quantity signal at the set detection sensitivity. A controller receives the gas quantity signal output from the gas quantity detector and outputs the sensitivity calibration signal to the gas quantity detector so that a magnitude of the gas quantity signal for one reference gas selected from gasses contained in the process gas becomes near a target value. Vacuum processing techniques are provided for stably detecting the content of impurity gas by calibrating the sensitivity of the gas quantity detector.

REFERENCES:
patent: 4172020 (1979-10-01), Tisone et al.
patent: 4362936 (1982-12-01), Hofmann et al.

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