Coating apparatus – Gas or vapor deposition
Reexamination Certificate
2009-10-14
2011-12-13
Lund, Jeffrie R (Department: 1716)
Coating apparatus
Gas or vapor deposition
C294S081100, C294S081540, C156S345100
Reexamination Certificate
active
08075691
ABSTRACT:
Disclosed herein is a vacuum processing apparatus for performing a desired process for a substrate after establishing a vacuum atmosphere therein. More particularly, the vacuum processing apparatus includes a vacuum chamber, which is divided into a chamber body and an upper cover. The upper cover is configured to be easily opened away from and closed to the chamber body.
REFERENCES:
patent: 2415259 (1947-02-01), Renton
patent: 3549190 (1970-12-01), Caldwell
patent: 4542928 (1985-09-01), Fowler, Jr.
patent: 5163726 (1992-11-01), Boos et al.
patent: 6565662 (2003-05-01), Amano et al.
patent: 6889627 (2005-05-01), Hao
patent: 6954585 (2005-10-01), Mokuo
patent: 7682454 (2010-03-01), Sneh
patent: 7879181 (2011-02-01), Lee et al.
patent: 2001/0006094 (2001-07-01), Amano et al.
patent: 2003/0180458 (2003-09-01), Sneh
patent: 2003/0201190 (2003-10-01), Graham et al.
patent: 2004/0110106 (2004-06-01), Mokuo
patent: 2006/0071384 (2006-04-01), Lee et al.
patent: 2006/0191118 (2006-08-01), Lee et al.
patent: 2007/0051312 (2007-03-01), Sneh
patent: 2007/0269983 (2007-11-01), Sneh
patent: 2009/0078200 (2009-03-01), Lee et al.
patent: 2009/0078373 (2009-03-01), Lee et al.
patent: 2009/0084316 (2009-04-01), Lee et al.
patent: 2010/0086381 (2010-04-01), Lee et al.
patent: 2010/0086382 (2010-04-01), Lee et al.
patent: 2010/0086383 (2010-04-01), Lee et al.
patent: 2010/0089531 (2010-04-01), Lee et al.
patent: 2001-185534 (2001-06-01), None
Office Action issued in U.S. Appl. No. 12/578,796 dated Jul. 14, 2011.
Office Action dated Oct. 19, 2009 for U.S. Appl. No. 11/346,621.
Choi Jun Young
Han Myung-Woo
Kim Gyeong-Hoon
Kim Hyung-Soo
Lee Jeong-Bin
Advanced Display Process Engineering Co. Ltd.
KED & Associates LLP
Lund Jeffrie R
LandOfFree
Vacuum processing apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Vacuum processing apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Vacuum processing apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4272111