Vacuum plasma treatment apparatus

Details Vacuum plasma treatment apparatus Vacuum plasma treatment apparatus

1985-02-08

1987-01-06

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118 501, 156345, 156643, C23C 1308

Patent

active

046338128

ABSTRACT:
An improvement in a vacuum plasma treating apparatus having a reaction chamber partly formed of electric insulating material subject to corrosion by a fluorine or chlorine containing gas plasma, which improvement being that the electric insulating material subject to corrosion comprises a sintered ceramic material containing alumina as a primary ingredient.

REFERENCES:
patent: 3121035 (1964-02-01), Heinze
patent: 4399016 (1983-08-01), Tsukada et al.
patent: 4419201 (1983-12-01), Levinstein et al.
patent: 4491496 (1985-01-01), Laporte et al.
patent: 4491606 (1985-01-01), Rosler et al.

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