Vacuum plasma generator

Details Vacuum plasma generator Vacuum plasma generator

2006-03-20

2008-11-25

Philogene, Haissa (Department: 2821)

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

C204S192120, C204S298230, C363S124000, C363S125000, C315S111210, C315S247000, C315S282000

Reexamination Certificate

active

07455755

ABSTRACT:
The invention relates to a vacuum plasma generator for providing a plasma discharge (10) for treating work pieces (5) by way of a pulsed plasma process in a vacuum chamber (2). Said vacuum plasma generator comprises a generator output (9, 9′) having an AC mains supply (6a), an AC/DC mains rectifier system (6) for rectifying the AC mains voltage to a DC voltage, a filter capacitor (6b), a first stage as clocked DC/DC voltage converter (7) with means for adjusting the DC output voltage which produces an intermediate circuit voltage (Uz), comprising a controlled power switch (7a) which feeds the primary winding of a transformer (14) and the secondary winding of which is connected to a rectifier (15) and a downstream intermediate capacitor (12) and configures a floating transformer secondary circuit (23). Said secondary circuit is connected to a downstream second stage which is a pulse output stage (8) and is connected to the generator output (9, 9′). The DC/DC voltage converter (7) has at least two floating transformer secondary circuits (23) and comprises a switch-over device (20) with a switch controller (22) for optionally switching the floating transformer secondary circuits (23) in parallel or in series.

REFERENCES:
patent: 5015493 (1991-05-01), Gruen
patent: 5303139 (1994-04-01), Mark
patent: 5993613 (1999-11-01), Manley
patent: 6256214 (2001-07-01), Farrington et al.
patent: 6296742 (2001-10-01), Kouznetsov
patent: 2005/0098430 (2005-05-01), Tuymer et al.

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