Vacuum microelectronic device and methodology for fabricating sa

Details Vacuum microelectronic device and methodology for fabricating sa Vacuum microelectronic device and methodology for fabricating sa

1994-12-16

1997-01-28

Patel, Nimeshkumar

Electric lamp and discharge devices

Discharge devices having a thermionic or emissive cathode

313495, 313309, 313336, H01J 2110

Patent

active

055980520

ABSTRACT:
A vacuum state microelectronic device comprising at least a cathode, an anode, and a grid, disposed in a cavity, and formed by the wafer bonding of two planar substrates. The technology permits multiple vacuum state microelectronic devices (vacuum tubes) to be arrayed on a single substrate in an integrated manner. So as to form a bond as strong as the substrate itself.

REFERENCES:
patent: 4069436 (1978-01-01), Nakayama et al.
patent: 4721885 (1988-01-01), Brodie
patent: 4990826 (1991-02-01), Cocks et al.
patent: 5079476 (1992-01-01), Kane
patent: 5163328 (1992-11-01), Holland et al.
patent: 5173634 (1992-12-01), Kane
patent: 5204581 (1993-04-01), Andreadakis et al.
patent: 5465024 (1995-11-01), Kane

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