Vacuum manifold pumping system

Details Vacuum manifold pumping system Vacuum manifold pumping system

1986-11-05

1988-02-16

Croyle, Carlton R.

Pumps

Diverse pumps

Series

417248, 417306, 417427, 417441, 118 50, 118715, 118719, 118725, F04B 2312, F04B 4900, C23C 1600

Patent

active

047252049

ABSTRACT:
Vacuum pumping system comprises a plurality of vacuum processing vessels, semiconductor processing reactors, and the like, connected to a common manifold evacuated by a generously large central vacuum unit. The manifold is maintained at a substantially constant designated pre-set pressure higher than the pressures within the reactors by means of a gas bleed inlet valve controllably feeding an inert gas into the manifold. A blower package with valving, interposed between each reactor and the common manifold, discharges directly into the manifold and prevents pressure surges and excursions in the manifold and reactors as well as permitting each reactor to operate at different pressures independently of the existing manifold pressure.

REFERENCES:
patent: 2358067 (1944-09-01), Hickman
patent: 2620969 (1952-12-01), Stephens
patent: 2887618 (1959-05-01), Reid
patent: 2971691 (1961-02-01), Lorenz
patent: 2996410 (1961-08-01), Hnilicka, Jr.
patent: 3007624 (1961-11-01), Netzel
patent: 3278113 (1966-10-01), Lundfurs
patent: 3636974 (1972-01-01), Berguiristain
patent: 3685539 (1972-08-01), Warren
patent: 4361418 (1982-11-01), Tscheppe
patent: 4636401 (1987-01-01), Yamazaki et al.
patent: 4648804 (1987-03-01), Jones et al.

Affiliated with

Also associated with

Rating

Vacuum manifold pumping system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Vacuum manifold pumping system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Vacuum manifold pumping system will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2218385