Vacuum leakage detecting device for use in semiconductor...

Measuring and testing – With fluid pressure – Leakage

Reexamination Certificate

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Reexamination Certificate

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10967195

ABSTRACT:
A vacuum leakage detecting device includes a process chamber for performing processes, a fluid valve, and a dry pump. The device further includes a helium gas sensor to detect helium gas in order to check vacuum leaks in potential external leak points.

REFERENCES:
patent: 3416359 (1968-12-01), Durbin et al.
patent: 3578758 (1971-05-01), Altshuler
patent: 3824839 (1974-07-01), Briggs
patent: 3939695 (1976-02-01), Booth
patent: 4785666 (1988-11-01), Bergquist
patent: 5131263 (1992-07-01), Handke et al.
patent: 5317900 (1994-06-01), Bergquist
patent: 5703281 (1997-12-01), Myneni
patent: 6286362 (2001-09-01), Coffman et al.
patent: 6658920 (2003-12-01), Abbel
patent: 6914927 (2005-07-01), Watson et al.
patent: 6964187 (2005-11-01), Pillion

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