Vacuum extraction system for chemical vapor deposition reactor v

Details Vacuum extraction system for chemical vapor deposition reactor v Vacuum extraction system for chemical vapor deposition reactor v

1992-12-10

1995-04-11

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Multizone chamber

118715, 118724, 423210, 423337, 422168, 422173, 422176, 422180, C23C 1600

Patent

active

054054451

ABSTRACT:
A vacuum extraction system is connected to a reactor vessel in which a chemical vapor deposition (CVD) process is carried out by using a suitable starting gas. The system comprises a pump for extracting a vacuum from the vessel, and a trapping device provided in the vessel and the pump for treating a starting gas pulled from the vessel into the system during the CVD process. The treatment of the starting gas pulled from the vessel is performed by using a gaseous oxidizing agent for separating a deposition component from the starting gas pulled from the vessel as an oxide, whereby a build-up of the component of the gas can be prevented in the pump. The trapping device comprises a tank body for receiving the starting gas pulled therein, and a perforated tube for introducing the gaseous oxidizing agent into the tank body to separate the deposition component of the received starting gas therefrom as an oxide.

REFERENCES:
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patent: 4250428 (1981-02-01), Oliver
patent: 4327057 (1982-04-01), Bruning
patent: 4801437 (1989-01-01), Konagaya
patent: 5075090 (1991-12-01), Lewis
patent: 5123836 (1992-06-01), Yoneda
patent: 5183646 (1993-02-01), Anderson

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