Coating apparatus – Gas or vapor deposition – With treating means
Patent
1997-04-17
1998-10-13
Bueker, Richard
Coating apparatus
Gas or vapor deposition
With treating means
118726, C23C 1600
Patent
active
058206809
ABSTRACT:
A vacuum evaporator is characterized in that hot-cathode filaments (7) are provided as the electron source around a tip of a rod evaporation material (4); the peripheries of the rod evaporation material (4) and the hot-cathode filaments (7) are disposed in parallel to a conductive cooling member (1) of a good heat conductive metal which is partly contacted with the atmosphere to decrease the dissipation of radiation heat produced from the hot-cathode filaments (7) and a tip (41) of the rod evaporation material (4) into a vacuum vessel a; heat absorbed by the conductive cooling member (1) is quickly conducted through the conductive cooling member and discharged to the atmosphere to prevent the temperature of the electron impact heating part from increasing and to prevent the increase of the gas discharge due to the heat dissipation from the electron impact heating part.
REFERENCES:
patent: 2960457 (1960-11-01), Kuhlman
Miyamoto Kazuo
Watanabe Humio
Bueker Richard
Musashino Engineering Co., Ltd.
Sukegawa Electric Co., Ltd.
LandOfFree
Vacuum evaporator does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Vacuum evaporator, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Vacuum evaporator will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-309515