Vacuum evaporation method for zinc sulfide

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board

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427 49, 427 50, 427 69, 427 70, 427 77, 427 78, 4272552, C23C 1400, C23C 1424, C23C 1426, C23C 1430

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active

049769880

ABSTRACT:
In a vacuum evaporation method for depositing a thin film on a substrate by heating a sublimable source material under vacuum to vaporize it, the source material is subjectd to vaporization in an unsintered state. Electron-beam heating may be employed. The primary advantage of avoiding precedent sintering of the source material is great reduction in scattering of fine particles of the source material in the vacuum chamber. Consequently the deposited film has an even and smooth surface. A representative of the sublimable source material is a II-VI compound semiconductor such as ZnS used as the host material of an electroluminescent phosphor. Thin-film electroluminsecent devices produced by using the vacuum evaporation method according to the invention possess improved reliability.

REFERENCES:
patent: 3113040 (1963-12-01), Winston
patent: 3431134 (1969-03-01), Thornton
patent: 3889016 (1975-06-01), Vlasenko et al.
patent: 4482799 (1984-11-01), Pricenski et al.
patent: 4879139 (1989-11-01), Ootsuka et al.
Bunshait et al, Deposition Technologies for Films and Coatings, (Noyes, Pk. Ridge, N.J.) c. 1982, pp. 95-121.
Maissel et al, Handbook of Thin Film Technology, (McGraw-Hill, N.Y.), c. 1970, pp. 15-5-15-7.
Pulker, Coatings on Glass, (Elsevier, Oxford), c. 1984, pp. 190-199.

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