Vacuum evaporation device

Details Vacuum evaporation device Vacuum evaporation device

1984-07-26

1986-08-19

Albritton, Clarence L.

Electric heating

Heating devices

Combined with container, enclosure, or support for material...

219271, 219275, 118727, C23C 1426, H01L 21203, H05B 306

Patent

active

046071520

ABSTRACT:
A vacuum evaporation device incorporates a main treatment enclosure connected to an auxiliary chamber containing a material evaporation cell. The cell is fixed to a tight bellows displacement member able to displace the cell between a first advanced position towards a main enclosure and a second retracted position. A sealing valve provided with a slide is provided for the main enclosure from the auxiliary chamber, whereby the material of the evaporation cell can thus be changed without placing the main enclosure under atmosphere again. A fixed heating tube, connecting the main enclosure to the auxiliary chamber, has a first end engaged in the main enclosure and a second end issuing into the auxiliary chamber. The second end is provided with an end piece made from a thermally insulating material ensuring mechanical continuity and thermal insulation with the support part and able to bearingly receive the evaporation cell when the latter is in the advanced position. The slide of the sealing valve is inserted between the end piece and the evaporation cell when the latter is in the retracted position, the travel of the cell between these end positions and consequently travel of the bellows being limited to the space necessary for closing the valve.

REFERENCES:
patent: 2551389 (1951-05-01), Oliver
patent: 2958899 (1960-11-01), Stein
patent: 3281517 (1966-10-01), Hemmer
patent: 3594242 (1971-07-01), Burd
patent: 3661117 (1972-05-01), Cornelius
patent: 3703155 (1972-11-01), Choisser
patent: 4061800 (1977-12-01), Anderson
patent: 4239955 (1980-12-01), Cho
patent: 4472622 (1984-09-01), Satoh
Budo, Y., "Integrated Sputter Etching . . . ", IBM Tech. Disc. Bull., vol. 19, No. 8, Jan. 1977, pp. 2823-2825.
Howell, J. R., "Evaporant Source", IBM Tech. Disc. Bull., vol. 9, No. 12, May 1967, p. 1677.

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