Vacuum evaporation apparatus

Details Vacuum evaporation apparatus Vacuum evaporation apparatus

1983-08-30

1985-08-13

Smith, John D.

Coating apparatus

Control means responsive to a randomly occurring sensed...

Temperature responsive

118718, 118724, 118725, 118730, 118 60, 118500, 165 61, 165 89, 165 90, 16510426, C23C 1308

Patent

active

045343128

ABSTRACT:
A vacuum evaporation apparatus for depositing an evaporant as a thin film on a substrate comprises a sealed container including a substrate support for mounting thereon the substrate. A heat medium such as of diphenyl, for example, is filled in the substrate support. The heat medium in the substrate support is supplied with heat by a heater. When heated, the heat medium is vaporized and the vapor gas having absorbed heat of evaporation is moved quickly from a high-temperature region to a low-temperature region. The vapor gas in the low-temperature region is supersaturated and turned into the heat medium liquid. The heat energy born as latent heat by the vapor gas is given off to heat the substrate support uniformly. With this thermosiphon action, the substrate can be heated through the substrate support so as to have a uniform overall temperature distribution for forming a uniformly deposited thin film on the substrate surface.

REFERENCES:
patent: 3216489 (1965-11-01), Norton
patent: 3818982 (1974-06-01), Wagner
patent: 4360058 (1982-11-01), Muellejans

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