Coating apparatus – Gas or vapor deposition – Multizone chamber
Patent
1987-12-10
1989-08-08
Bueker, Richard
Coating apparatus
Gas or vapor deposition
Multizone chamber
118725, 118726, 118730, 114221, C23C 1400
Patent
active
048542644
ABSTRACT:
An vacuum evaporating apparatus for depositing thin films on a substrate comprises a vacuum tank, a hot-wall furnace for heating and evaporating a material to be evaporated, an auxiliary vacuuming means connected to the vacuum tank through a gate valve, a substrate exchanging mechanism for an evaporated substrate with a new substrate through the auxiliary vacuuming device, and a substrate transferring unit generally of a turn table located to be rotatable above the hot-wall furnace. The hot-wall furnaces are disposed in standing state in the vacuum tank, each of hot-wall furnaces being provided with a plurality of crucibles coaxial in a vertical direction in which the evaporation source materials are accommodated, heaters independently provided for the respective crucibles, and thermocouples connected to the respective heaters to independently control the temperatures of the respective crucibles. The thermocouples are operatively connected to socket pins, at the bottom of the hot-wall furnace, and are made of the same materials as those constituting metal portions of the respective thermocouples.
REFERENCES:
patent: 3925146 (1975-12-01), Olsen
patent: 4286545 (1981-09-01), Takagi
patent: 4482799 (1984-11-01), Pricenski
patent: 4542712 (1985-09-01), Sato
patent: 4543467 (1985-09-01), Eisele
patent: 4668480 (1987-05-01), Fujiyashu
patent: 4681773 (1987-07-01), Bean
Fujiyasu Hiroshi
Noma Hiroshi
Bueker Richard
Fuji Seiki Inc.
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