Vacuum device for handling workpieces

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

2504411, 414217, 414221, H01V 3718

Patent

active

049489798

ABSTRACT:
A vacuum device comprises a vacuum working chamber for performing a predetermined process to a material such as substrate and a vacuum prechamber for changing the material. Both the vacuum chambers are coupled by a coupling member so as to communicate the interiors of the respective chambers and the communcation is managed by valve means located for the coupling member. Both vacuum chambers may be constructed so as to be movable or pivotable horizontally with respect to each other. The coupling member may be constructed as an independent member which is inserted between both the vacuum chambers as occasion demands.

REFERENCES:
patent: 3761709 (1973-09-01), Hasegawa et al.
patent: 3874525 (1975-04-01), Hassan et al.
patent: 3958124 (1976-05-01), Koch et al.
patent: 4227080 (1980-10-01), Okura et al.
patent: 4749868 (1988-06-01), Hatanaka et al.
patent: 4763005 (1988-08-01), Schumer

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Vacuum device for handling workpieces does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Vacuum device for handling workpieces, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Vacuum device for handling workpieces will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-464613

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.