Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating
Patent
1979-04-30
1981-06-23
Gantz, Delbert E.
Chemistry: electrical and wave energy
Processes and products
Vacuum arc discharge coating
118719, 118729, 204298, C23C 1500
Patent
active
042749360
ABSTRACT:
A large scale vacuum deposition facility is disclosed in which substrates, in the form of architectural glass lights on supporting racks, are moved through an evacuated working chamber system where the substrates are coated by cathodic sputtering. The substrate racks are moved by a conveyor system through the working chamber system via an access chamber system, enabling substantially continuous production of coated substrates without requiring the working chamber system be opened to atmosphere.
Operation of the working chamber system, the access chamber system, the conveyor system and associated components is monitored and governed from a process control console.
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Advanced Coating Technology, Inc.
Gantz Delbert E.
Leader William
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