Vacuum deposition process

Details Vacuum deposition process Vacuum deposition process

1990-12-06

1992-12-01

Pianalto, Bernard

Coating processes

Direct application of electrical, magnetic, wave, or...

Resistance heating

4272481, 427250, 4272555, 4272556, 427294, B05D 314

Patent

active

051679841

ABSTRACT:
A vacuum evaporation container including a resistively heatable cylindrical crucible having at least one open end and having an axially aligned slot and a hollow cylindrical insert concentrically located within the cylindrical crucible, the insert having a slot aligned with the slot of the crucible, closed ends and an electrical conductivity less than the electrical conductivity of the electrically conductive cylindrical crucible. This vacuum evaporation container is employed in a vacuum deposition process.

REFERENCES:
patent: 3582611 (1971-06-01), Matheson et al.
patent: 3637980 (1972-01-01), Fox et al.
patent: 3748090 (1973-07-01), Cuffini et al.
patent: 3845739 (1974-11-01), Erhart et al.
patent: 3861353 (1976-01-01), Erhart et al.
patent: 4343834 (1982-08-01), Saito et al.
patent: 4842973 (1989-06-01), Badesha et al.
Patent Abstracts of Japan, vol. 9, No. 66, Mar. 26, 1985.
Patent Abstracts of Japan, vol. 9, No. 71, Mar. 30, 1985.

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