Vacuum deposition method for frequency adjustment of piezoelectr

Coating processes – Measuring – testing – or indicating – Thickness or uniformity of thickness determined

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

29 2535, 427100, 427124, 427248R, 427250, B05D 512, C23C 1304

Patent

active

041121341

ABSTRACT:
Vacuum deposition method for adjusting the resonant frequency of piezoelectric resonators wherein the speed and accuracy of the process are enhanced by abrupt termination of the deposition through injection of a gas into the vacuum chamber at the end of the adjustment cycle.

REFERENCES:
patent: 2123227 (1938-07-01), Bieling
patent: 2978364 (1961-04-01), Blaustein
patent: 3383238 (1968-05-01), Unzicker et al.
patent: 3400014 (1968-09-01), Blumberg et al.
patent: 3486217 (1969-12-01), Congleton et al.
patent: 3498818 (1970-03-01), Bahm et al.
patent: 3549414 (1970-12-01), Curran et al.
patent: 3573960 (1971-04-01), Duncan

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Vacuum deposition method for frequency adjustment of piezoelectr does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Vacuum deposition method for frequency adjustment of piezoelectr, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Vacuum deposition method for frequency adjustment of piezoelectr will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2097172

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.