Vacuum deposition apparatus

Details Vacuum deposition apparatus Vacuum deposition apparatus

1983-04-27

1983-11-01

Demers, Arthur P.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

204192R, C23C 1500

Patent

active

044129050

ABSTRACT:
A vacuum deposition apparatus including a cathode, an anode associated with the substrate to be coated and permanent magnet means whose lines of force are directed substantially parallel to the surface of the substrate, at least closely adjacent to that surface, and whose strength is such as to divert high-energy electrons away from the surface in order substantially to prevent them bombarding that surface.

REFERENCES:
patent: 3616450 (1971-10-01), Clark
patent: 4094764 (1978-06-01), Boucher et al.
patent: 4155825 (1979-05-01), Fournier

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