Vacuum deposition and curing of liquid monomers

Details Vacuum deposition and curing of liquid monomers Vacuum deposition and curing of liquid monomers

1992-08-21

1993-11-09

Beck, Shrive

Coating processes

Electrical product produced

Metal coating

427294, C23C 2600

Patent

active

052600955

ABSTRACT:
The present invention is the formation of solid polymer layers under vacuum. More specifically, the present invention is the use of "standard" polymer layer-making equipment that is generally used in an atmospheric environment in a vacuum, and degassing the monomer material prior to injection into the vacuum. Additional layers of polymer or metal may be vacuum deposited onto solid polymer layers.
Formation of polymer layers under a vacuum improves material and surface characteristics, and subsequent quality of bonding to additional layers. Further advantages include use of less to no photoinitiator for curing, faster curing, fewer impurities in the polymer electrolyte, as well as improvement in material properties including no trapped gas resulting in greater density, and reduced monomer wetting angle that facilitates spreading of the monomer and provides a smoother finished surface.

REFERENCES:
patent: 3489593 (1970-01-01), Cohen
patent: 4098965 (1978-07-01), Kinsman
patent: 4477485 (1984-10-01), Muramatsu
patent: 4543275 (1985-09-01), Akashi
patent: 4551349 (1985-11-01), Kovacena
patent: 4555274 (1985-11-01), Kitajima
patent: 4557978 (1985-12-01), Mason
patent: 4774141 (1988-09-01), Matsui
patent: 4844851 (1989-07-01), Hotta
patent: 4933129 (1990-06-01), Huykman
patent: 5024879 (1991-06-01), Massa

Affiliated with

Also associated with

Rating

Vacuum deposition and curing of liquid monomers does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Vacuum deposition and curing of liquid monomers, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Vacuum deposition and curing of liquid monomers will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1141334