Vacuum depositing apparatus

Details Vacuum depositing apparatus Vacuum depositing apparatus

1985-05-29

1987-03-10

Bueker, Richard

Coating apparatus

Gas or vapor deposition

Having means to expose a portion of a substrate to coating...

118715, 118718, 118724, 118726, 118728, 118730, 118504, C23C 1308

Patent

active

046483470

ABSTRACT:
In vacuum depositing apparatus, especially for the manufacture of magnetic tapes, a substrate holder is disposed in the form of a cooling cylinder, and in the path of the vapor stream there is a mask for the purpose of geometrically restricting the vapor stream. In order to prevent any condensation of vaporized material in solid form, the surface of the mask facing the vapor stream is not aligned horizontally, and its lowermost edge lies within the projected surface of the crucible opening. The surface of the mask can be heated up to a temperature that is between the vaporizing temperature and the solidification temperature of the vaporized material. In an especially advantageous manner, the surface of the mask is formed by tiles of a ceramic material.

REFERENCES:
patent: 2793609 (1957-05-01), Shen et al.
patent: 3277865 (1966-10-01), Smith, Jr.
patent: 3342632 (1967-09-01), Bate et al.
patent: 3690635 (1972-09-01), Harker et al.
patent: 3971334 (1976-07-01), Pundsack
patent: 4477489 (1984-10-01), Yanai et al.
U.S. patent application Ser. No. 195,559, filed Oct. 9, 1980.

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