Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1995-06-02
1996-07-23
Nguyen, Nam
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429825, 20429834, 20429835, C23C 1434
Patent
active
055386105
ABSTRACT:
A vacuum coating system has a processing station (2) designed as a sputter-etching station, in which a high-frequency input electrode (25) is mounted between two substrate holders (23, 24), which carry the substrates (5, 6). Between the substrate holders (23, 24) and the high-frequency input electrode (25), a distance (a) is provided, which is smaller than the dark space distance.
REFERENCES:
patent: 3787312 (1974-01-01), Wagner et al.
patent: 4194962 (1980-03-01), Chambers et al.
patent: 4593644 (1986-02-01), Hanak
patent: 5133285 (1992-10-01), Mahler et al.
patent: 5244554 (1993-09-01), Yamagata et al.
patent: 5244559 (1993-09-01), Latz
Gesche Roland
Keim Karl
Rauner Helmut
Wurpts Gunter
Leybold Aktiengesellschaft
Nguyen Nam
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