Vacuum coating forming device

Details Vacuum coating forming device Vacuum coating forming device

1999-09-13

2000-07-18

Dang, Thi

Coating apparatus

Gas or vapor deposition

With treating means

118723R, 118723VE, 118723FE, 118723FI, 20429804, 20429805, 20429806, 20429836, C23C 1600

Patent

active

060891866

ABSTRACT:
The invention provides a vacuum coating forming device for forming a thin-film coating by a plasma beam on a substrate arranged in a vacuum chamber, the vacuum coating forming device being provided with a pressure gradient type plasma gun for generating the plasma beam toward the vacuum chamber and a converging coil which is provided so as to surround a short-tube portion of the vacuum chamber projecting toward an outlet of the plasma gun and which reduces a cross section of the plasma beam. This vacuum coating forming device further comprises an insulating tube provided at the outlet so as to surround the plasma beam and project in electric floating state, and an electron return electrode which surrounds the insulating tube within the short-tube portion and which is higher in electric potential than the outlet.

REFERENCES:
patent: 3562141 (1971-02-01), Morley
patent: 5009922 (1991-04-01), Harano et al.
patent: 5368676 (1994-11-01), Nagaseki et al.
patent: 5413663 (1995-05-01), Shimizu et al.
patent: 5677012 (1997-10-01), Sakemi et al.

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