Coating apparatus – Gas or vapor deposition – Having means to expose a portion of a substrate to coating...
Patent
1978-11-30
1980-09-16
Kimlin, Edward C.
Coating apparatus
Gas or vapor deposition
Having means to expose a portion of a substrate to coating...
118 50, 118504, 118730, 118 53, 269 57, 427 70, 427 91, 427109, 427124, 427251, 4272555, B44D 134, C23F 134
Patent
active
042223458
ABSTRACT:
Coating apparatus having a vacuum chamber and a rotary motion assembly rotatably mounted in the vacuum chamber. Drive means is carried by the vacuum chamber for rotating the rotary motion assembly on an axis. At least one coating source is disposed within the chamber and is generally coincident with the axis of rotation for the rotary motion assembly. A mask structure is mounted in the chamber for rotational movement about an axis which is generally coincident with the axis of rotation of the rotary motion assembly. Additional drive means is provided for rotating the mask structure as the rotary motion assembly is rotated.
REFERENCES:
patent: 3312190 (1967-04-01), Bradshaw
patent: 3352282 (1967-11-01), Schweitzer
patent: 3511212 (1970-05-01), Burns
patent: 3735728 (1973-05-01), Krumme et al.
patent: 3777703 (1973-12-01), Gillie
patent: 3853091 (1974-12-01), Christenson et al.
patent: 3991707 (1976-11-01), Thelen et al.
Bergfelt Nils H.
Seddon Richard I.
Kimlin Edward C.
Optical Coating Laboratory, Inc.
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