Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1978-12-20
1981-04-14
Bowers, Jr., Charles L.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
118324, 118503, 118719, 118725, 118729, 118733, C23C 1500, C23C 1310
Patent
active
042618088
ABSTRACT:
Vacuum coating apparatus having a vacuum chamber containing at least one cathode system and having a system for the continuous or intermittent transport of substrates during the coating. The transport system includes flexible, endless conveyor means in pairs guided in the manner of two parallel chain drives over wheel pairs positioned at a distance from one another in the formation of two straight runs. The substrates are fastened to the conveyors so as to be movable parallel to the cathode system. The straight runs of each endless conveyor is guided vertically at least in the area of the cathode systems.
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Byrne, T. M. et al., IBM Tech. Discl. Bulletin, pp. 1034-1036, vol. 13, No. 4, 10/1970.
Bowers Jr. Charles L.
Leybold-Heraeus GmbH
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