Vacuum coating apparatus with a crucible in the vacuum chamber t

Details Vacuum coating apparatus with a crucible in the vacuum chamber t Vacuum coating apparatus with a crucible in the vacuum chamber t

1996-10-31

1999-03-30

Dang, Thi

Coating apparatus

Gas or vapor deposition

With treating means

118723VE, 20429806, 20429808, C23C 1400

Patent

active

058883053

ABSTRACT:
A vacuum chamber contains a crucible (4) and an electron beam source (5) for evaporating material in the crucible. A substrate holder (6) holds substrates (7) above the crucible (4) with a process space therebetween. A magnetron cathode (11, 12) is located in each of two compartments (9, 10) located on either side of the process space. An aperture (21, 22) connects each compartment to the process space; each cathode (11, 12) carries a target (13, 14) facing away from the respective aperture (21, 22). The cathodes are connected to a medium frequency RF power supply (16), and process gas is supplied to the compartments by lines (17, 18).

REFERENCES:
patent: 4885070 (1989-12-01), Campbell et al.
patent: 4956070 (1990-09-01), Nakada
patent: 5302208 (1994-04-01), Grimm et al.
patent: 5399252 (1995-03-01), Scherer et al.
patent: 5415757 (1995-05-01), Szczyrbowski
patent: 5597622 (1997-01-01), Zoller et al.
patent: 5656141 (1997-08-01), Betz et al.

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