Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Reexamination Certificate
2005-09-13
2005-09-13
McDonald, Rodney G. (Department: 1753)
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
C204S298250, C118S718000
Reexamination Certificate
active
06942768
ABSTRACT:
A system for coating band-shaped material, where the band-shaped material travels through at least one process chamber in which there is a vacuum, and at least one cooling roller. On the peripheral surface of each cooling roller are at least two magnetron sputter sources that are arranged separate from one another in magnetron chambers, which are formed by separate magnetron chamber walls and allow each chamber to be evacuated, so the pressure in the magnetron chamber can be maintained higher than that in the process chamber. The magnetron chamber walls and the magnetron sputter sources can be mounted on a common carriage, which is displaceable parallel to the cooling roller axis. The result is the reduction in the maintenance costs in cleaning of the magnetron chamber walls and at the same time improvement of the separation of gas between the magnetron chambers and the process chamber.
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patent: 19735603 (1998-11-01), None
Copy of catalog “Sputter Web Coaters”.
Erbkamm Wolfgang
Hecht Hans-Christian
Hofmann Michael
Milde Falk
Baker & Botts L.L.P.
McDonald Rodney G.
Von Ardenne Anlagentechnik GmbH
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