Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1994-03-16
1994-12-13
Nguyen, Nam
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429815, 20429823, 20429825, 20429828, C23C 1434
Patent
active
053726936
ABSTRACT:
A vacuum coating apparatus has a pot-like tank (2) against whose open side a portion of a substrate (1) can be held sealingly. In the tank (2) there is disposed a target (7). A shut-off plate (9) makes it possible after lowering the substrate (1) to hold this target (7) under vacuum in a source chamber (11) protected against intrusion of air.
REFERENCES:
patent: 4416759 (1983-11-01), Harra et al.
patent: 4450062 (1984-05-01), Macaulay
patent: 4514275 (1985-04-01), Shimada et al.
patent: 4986890 (1991-01-01), Setoyama et al.
patent: 5254236 (1993-10-01), Kinokiri et al.
Brauer Gunter
Patz Ulrich
Scherer Michael
Szczyrbowski Joachim
Leybold Aktiengesellschaft
Nguyen Nam
LandOfFree
Vacuum coating apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Vacuum coating apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Vacuum coating apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1191148