Vacuum-assisted pad conditioning system and method utilizing...

Details Vacuum-assisted pad conditioning system and method utilizing... Vacuum-assisted pad conditioning system and method utilizing...

2006-05-30

2006-05-30

Eley, Timothy V. (Department: 3724)

Abrading

Abrading process

Utilizing fluent abradant

C451S056000, C451S060000, C451S072000, C451S443000, C451S444000

Reexamination Certificate

active

07052371

ABSTRACT:
A method and apparatus for conditioning polishing pads that utilize an apertured conditioning disk for introducing operation-specific slurries, without the need for additional tooling, platens, and materials handling. The a method and apparatus utilize a vacuum capability to pull waste material out of the conditioning pad and through the apertured conditioning disk to evacuate the apparatus through an outlet port, the apparatus may also include self-contained flushing means and a piezo-electric device for vibrating the pad conditioning apparatus.

REFERENCES:
patent: 4222204 (1980-09-01), Benner
patent: 5081051 (1992-01-01), Mattingly et al.
patent: 5216843 (1993-06-01), Breivogel et al.
patent: 5486131 (1996-01-01), Cesna et al.
patent: 5531635 (1996-07-01), Mogi et al.
patent: 5885137 (1999-03-01), Ploessl
patent: 5904615 (1999-05-01), Jeong et al.
patent: 5916010 (1999-06-01), Varian et al.
patent: 6099393 (2000-08-01), Katagiri et al.
patent: 6179693 (2001-01-01), Beardsley et al.
patent: 6200207 (2001-03-01), Hsu
patent: 6263605 (2001-07-01), Vanell
patent: 6302771 (2001-10-01), Liu et al.
patent: 6331136 (2001-12-01), Bass et al.
patent: 6508697 (2003-01-01), Benner et al.

Affiliated with

Also associated with

Rating

Vacuum-assisted pad conditioning system and method utilizing... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Vacuum-assisted pad conditioning system and method utilizing..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Vacuum-assisted pad conditioning system and method utilizing... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3607036