Vacuum-assisted pad conditioning system

Details Vacuum-assisted pad conditioning system Vacuum-assisted pad conditioning system

2007-08-13

2009-08-18

Eley, Timothy V (Department: 3724)

Abrading

Machine

Combined

C451S005000, C451S008000, C451S021000, C451S443000, C451S456000

Reexamination Certificate

active

07575503

ABSTRACT:
A method and apparatus for conditioning polishing pads that utilize an apertured conditioning disk for introducing operation-specific slurries, without the need for additional tooling, platens, and materials handling. The method and apparatus utilize a vacuum capability to pull waste material out of the conditioning pad and through the apertured conditioning disk to evacuate the apparatus through an outlet port, the apparatus may also include self-contained flushing means and a piezo-electric device for vibrating the pad conditioning apparatus.

REFERENCES:
patent: 5456627 (1995-10-01), Jackson et al.
patent: 5486131 (1996-01-01), Cesna et al.
patent: 5531635 (1996-07-01), Mogi et al.
patent: 5885137 (1999-03-01), Ploessl
patent: 5916010 (1999-06-01), Varian et al.
patent: 6099393 (2000-08-01), Katagiri et al.
patent: 6179693 (2001-01-01), Beardsley et al.
patent: 6200207 (2001-03-01), Hsu
patent: 6331136 (2001-12-01), Bass et al.
patent: 6488573 (2002-12-01), Kobayashi et al.
patent: 6508697 (2003-01-01), Benner et al.
patent: 7052371 (2006-05-01), Benner
patent: 2004/0157538 (2004-08-01), Ramarajan

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