Vacuum arc vapor deposition process and apparatus

Details Vacuum arc vapor deposition process and apparatus Vacuum arc vapor deposition process and apparatus

2006-04-25

2006-04-25

McDonald, Rodney G. (Department: 1753)

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

C204S298410

Reexamination Certificate

active

07033462

ABSTRACT:
To prevent the film forming characteristic deterioration by a magnetic field of a magnetic filter to thereby make vacuum arc vapor deposition uniform, in the invention, plurality of magnets includes a terminal magnet closest to a plasma injection hole located at the other end of duct and specified magnets. The terminal magnet located closest to plasma injection hole may be set to incline to a plasma injection plane of the plasma injection hole. Further, at lease one of specified magnets may be inclined to the plasma injection plane. Further more, at least one of magnetic field generating coils may be formed with a plurality of electromagnetic coils, which are inclined at different angles with respect to a cross section of the duct. One of electromagnetic coils may be selectively energized by current on a basis of setting and controlling of deflection magnetic field generated by the magnetic filter.

REFERENCES:
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patent: 5480527 (1996-01-01), Welty
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Machine translation of 2001-059165.
Notice of Reasons for Rejection (Office Action) for Japanese Patent Application No. 2002-162728, mailed Aug. 2, 2005 and English translation thereof.

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