Coating apparatus – Gas or vapor deposition – With treating means
Patent
1990-06-19
1992-04-14
Beck, Shrive
Coating apparatus
Gas or vapor deposition
With treating means
427 37, 21912115, 21912121, 21912134, 21912135, C23C 1400, C23C 1422
Patent
active
051037661
ABSTRACT:
A vacuum arc deposition device having electrode switching means comprising two or more electrodes consisting of vacuum arc vapor evaporation source materials and a substrate to which films are formed by means of vacuum arc vapor deposition, each of the electrodes and the substrate being contained in a vacuum chamber capable of introducing a reactive gas, wherein the electrodes are connected to arc discharging DC power supplies by way of polarity switching means so that each of the electrodes functions as a cathode and an anode alternately. Films, in particular, of insulative property can stably be vapor deposited on a substrate for a long period of time continuously.
REFERENCES:
patent: 3793179 (1974-02-01), Sablev et al.
patent: 3836451 (1975-12-01), Snaper
patent: 4828934 (1989-05-01), Pinkhasov
Hasegawa Hakumi
Yoshikawa Tetsuya
Beck Shrive
Burke Margaret
Kabushiki Kaisha Kobe Seiko Sho
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