Vacuum arc vapor deposition apparatus and vacuum arc vapor...

Details Vacuum arc vapor deposition apparatus and vacuum arc vapor... Vacuum arc vapor deposition apparatus and vacuum arc vapor...

2005-03-15

2005-03-15

McDonald, Rodney G. (Department: 1753)

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

C204S298410

Reexamination Certificate

active

06866753

ABSTRACT:
A vacuum arc vapor deposition apparatus includes a plurality of magnetic coils for guiding a plasma produced by a vacuum arc evaporating source to the vicinity of a substrate in a film forming chamber by use of a deflection magnetic field. The vacuum arc vapor deposition apparatus further includes a coil power source for reversing a coil current to be fed to the magnetic coils, and a control unit for controlling the coil power source to reverse the flowing direction of the coil current.

REFERENCES:
patent: 4724058 (1988-02-01), Morrison, Jr.
patent: 5279723 (1994-01-01), Falabella et al.
patent: 5480527 (1996-01-01), Welty
patent: 0 926 699 (1999-06-01), None
patent: A 10-505633 (1998-06-01), None
patent: A 10-280135 (1998-10-01), None
patent: A 2000 34561 (2000-02-01), None
patent: A 2001 3160 (2001-01-01), None
patent: WO 9529272 (1995-11-01), None
European Search Report dated Jun. 18, 2002, from European Patent Application No. EP02007409.2-2119.

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