Vacuum arc vapor deposition apparatus

Chemistry: electrical and wave energy – Apparatus – Vacuum arc discharge coating

Reexamination Certificate

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C204S192380

Reexamination Certificate

active

07060167

ABSTRACT:
A vacuum arc vapor deposition apparatus can form a film of good quality without uselessly increasing a time from start of film deposition to completion thereof even when a trigger electrode induces vacuum arc discharge in response to turn-off of the vacuum arc discharge during deposition of the film onto the deposition target object. For example, the vacuum arc vapor deposition apparatus includes a shield member moved to and away from a position between a vapor source and a holder for supporting the deposition target object, a drive device for locating the shield plate selectively in a shield position between the vapor source and the holder, and a retracted position shifted from the shield position, a detector (e.g., current detector) detecting turn-on/off of the vacuum arc discharge, and a control portion controlling the drive device to locate the shield plate in the shield position when the detector detects turn-off of the vacuum arc discharge, and to locate the shield plate in the retracted position when a time required for stabilizing the vacuum arc discharge elapses after the detector detected turn-on of the vacuum arc discharge.

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Taki et al., “Shielded Arc Ion Plating and Structural Characterization of amorphous carbon nitride thin films,” pp. 183-190, Jul. 30, 1997.

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