Vacuum-arc plasma source

Chemistry: electrical and wave energy – Apparatus – Vacuum arc discharge coating

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

20419238, C23C 1432

Patent

active

053804210

ABSTRACT:
An apparatus for the production of coatings in a vacuum, including a rectangular cathode plate and primary and auxiliary anodes, is provided with static and dynamic magnetic stabilizing subsystems. The static stabilizing subsystem comprises linear conductors arranged parallel to the long sides of the cathode plate. The dynamic magnetic stabilizing subsystem includes a series of linear conductors arranged at right angles to the working surface of the cathode plate, activated in sequence. The static and dynamic magnetic stabilizing systems operate to stabilize the electric arc on the working surface of the cathode.

REFERENCES:
patent: 3783231 (1974-01-01), Sablev et al.
patent: 3793179 (1974-02-01), Sablev et al.
patent: 3836451 (1974-09-01), Snaper
patent: 4448659 (1984-05-01), Morrison, Jr.
patent: 5160595 (1992-11-01), Hauzer et al.
patent: 5306407 (1994-04-01), Hauzer et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Vacuum-arc plasma source does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Vacuum-arc plasma source, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Vacuum-arc plasma source will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-848837

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.