Vacuum arc evaporation method

Details Vacuum arc evaporation method Vacuum arc evaporation method

1996-12-18

1999-10-05

Warden, Jill

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

134 1, 427540, 427547, 427585, 427598, B08B 700

Patent

active

059617292

ABSTRACT:
A vacuum arc evaporation method of disposing a vacuum arc evaporation source and a substrate in a vacuum chamber, and introducing ions generated by arc discharge on the surface of the vacuum arc evaporation source to the substrate by means of magnetic fields, thereby forming a film, wherein the substrate is cleaned before forming the film by generating the arc disc while supplying a gas mixture of a nitrogen gas and an argon gas, a xenon gas, or a gas mixture of nitrogen gas and a xenon gas in the vacuum chamber. A film with improved adhesion and surface roughness can be obtained.

REFERENCES:
patent: 4683149 (1987-07-01), Suzuki et al.
patent: 4693760 (1987-09-01), Sioshansi
patent: 4857137 (1989-08-01), Tachi et al.
patent: 5126030 (1992-06-01), Tamagaki et al.
patent: 5182000 (1993-01-01), Antonelli et al.
patent: 5342283 (1994-08-01), Good
patent: 5346600 (1994-09-01), Nleh et al.
patent: 5580429 (1996-12-01), Chan et al.

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