Chemistry: electrical and wave energy – Apparatus – Vacuum arc discharge coating
Patent
1994-12-16
1998-04-28
Nguyen, Nam
Chemistry: electrical and wave energy
Apparatus
Vacuum arc discharge coating
20419238, C23C 1422
Patent
active
057440174
ABSTRACT:
A vacuum arc deposition apparatus includes arc power sources having cathodes connected to both ends of an evaporation source; exciting coils disposed at positions axially outwardly far from both the ends of the evaporation source so as to be coaxial with the evaporation source; and coil power sources independently connected to the exciting coils. In this apparatus, each of the coil power sources is capable of controlling the exciting current in such a manner that the film thickness and the consumption of the evaporation source are suitably distributed. Moreover, an arc containment device of the vacuum arc deposition apparatus includes an arc containment body having a diameter substantially the same as that of a cylindrical evaporation source, which is disposed at one end portion of the evaporation source.
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Fujii Hirofumi
Hanaguri Koji
Kawaguchi Hiroshi
Shimojima Katsuhiko
Suzuki Takeshi
Kabushiki Kaisha Kobe Seiko Sho
Nguyen Nam
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