Measuring and testing – Gas analysis – Solid content of gas
Reexamination Certificate
2005-03-29
2008-12-16
Rogers, David A. (Department: 2856)
Measuring and testing
Gas analysis
Solid content of gas
C073S028040, C073S031050, C250S573000, C250S574000, C356S335000, C356S336000
Reexamination Certificate
active
07464581
ABSTRACT:
It is an object to provide a vacuum apparatus capable of evaluating its cleanness precisely by surely monitoring particles including deposits readily detached from the apparatus, and a particle monitoring method and program employed therein, and a window member for particle monitoring.A semiconductor manufacturing apparatus1000includes a processing chamber100for performing a manufacturing processing on a wafer. A gas supply line for introducing a purge gas is connected to an upper portion of the processing chamber100, a valve120being installed on the gas supply line. A rough pumping line200with a valve a is connected to a lower portion of the processing chamber100. Installed on the rough pumping line200are a dry pump220for exhausting a gas in the processing chamber100and a particle monitoring unit210for monitoring particles between the valve a and the dry pump220. In the semiconductor manufacturing apparatus1000, after the valve120is opened, the purge gas is supplied to apply physical vibration due to shock wave in the processing chamber100so that deposits are detached therefrom to be monitored as particles.
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Moriya Tsuyoshi
Nakayama Hiroyuki
Oblon & Spivak, McClelland, Maier & Neustadt P.C.
Rogers David A.
Tokyo Electron Limited
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