Vacuum apparatus and vacuum processing method

Details Vacuum apparatus and vacuum processing method Vacuum apparatus and vacuum processing method

2007-04-17

2007-04-17

McDonald, Rodney G. (Department: 1753)

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

C204S192100, C204S192110, C118S7230AN, C323S212000, C250S42300F, C250S427000, C315S111210, C315S111310, C315S111510, C315S111810

Reexamination Certificate

active

10657192

ABSTRACT:
A vacuum apparatus which can easily regenerate plasma is provided. A matching box used in the vacuum apparatus can vary the impedance thereof by varying the magnitudes of the inductance of variable inductance elements. Controlling the magnitude of direct current makes it possible to control the magnitudes of inductance of the variable inductance elements so that it is possible to carry out matching operation at high speed.

REFERENCES:
patent: 4851668 (1989-07-01), Ohno et al.
patent: 5308461 (1994-05-01), Ahonen
patent: 5793162 (1998-08-01), Barnes et al.
patent: 6211749 (2001-04-01), Yuzurihara et al.
patent: 6252354 (2001-06-01), Collins et al.
patent: 9-92199 (1997-04-01), None
patent: 9-161704 (1997-06-01), None
patent: 2000-165175 (2000-06-01), None

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