Vaccum arc vapor deposition device

Details Vaccum arc vapor deposition device Vaccum arc vapor deposition device

1992-04-10

1993-06-22

Bueker, Richard

Coating apparatus

Condition responsive control

118712, 118723, 20429841, C23C 1428, C23C 1432, C23C 1454

Patent

active

052213498

ABSTRACT:
A vacuum arc vapor deposition device comprising an accumulation means for accumulating with time an electric power supplied to a vacuum arc evaporation source and an correcting means for correcting an arc current value so that an evaporation amount from the vacuum arc evaporation source is substantially constant in accordance with the increase of the electric power accumulated by the accumulating means.
The evaporation property due the consumption of the vacuum arc evaporation source can be corrected automatically and reproducibility between each of the processing lots can be obtained automatically without operators' aid.

REFERENCES:
patent: 4512867 (1985-04-01), Andreev et al.
patent: 4662312 (1987-05-01), Aoki
Patent Abstracts of Japan, vol. 13, No. 575 (C-667), Dec. 19, 1989, & JP-A-240-645, Sep. 26, 1989, M. Yamashita, et al., "Vacuum Deposition Apparatus".

Affiliated with

Also associated with

Rating

Vaccum arc vapor deposition device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Vaccum arc vapor deposition device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Vaccum arc vapor deposition device will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1438839