UV Light resistant p-methylstyrene/methyl methacrylate copolymer

Details UV Light resistant p-methylstyrene/methyl methacrylate copolymer UV Light resistant p-methylstyrene/methyl methacrylate copolymer

1979-09-24

1980-12-30

Wong, Jr., Harry

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymers from only ethylenic monomers or processes of...

C08F21212, C08F22014

Patent

active

042424852

ABSTRACT:
This invention provides UV light resistant polymers that comprise copolymers of p-methylstyrene and methyl methacrylate containing between about 20 weight percent and about 50 weight percent methyl methacrylate.

REFERENCES:
patent: 3427275 (1969-02-01), Davis et al.
patent: 4137389 (1979-01-01), Wingler et al.

Affiliated with

Also associated with

Rating

UV Light resistant p-methylstyrene/methyl methacrylate copolymer does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with UV Light resistant p-methylstyrene/methyl methacrylate copolymer, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and UV Light resistant p-methylstyrene/methyl methacrylate copolymer will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-8254