UV light exposure for functionalization and hydrophobization...

Details UV light exposure for functionalization and hydrophobization... UV light exposure for functionalization and hydrophobization...

2007-02-06

2009-12-15

Wood, Elizabeth D (Department: 1793)

Catalyst, solid sorbent, or support therefor: product or process

In form of a membrane

C502S005000, C502S060000, C502S077000, C502S232000, C423S702000, C327S100000

Reexamination Certificate

active

07632771

ABSTRACT:
A method is provided for making pure-silica-zeolite films useful as low-k material, specifically, more hydrophobic, homogeneous and with absence of cracks. The method utilizes a UV cure; preferably the UV cure is performed at temperatures at higher than the deposition temperature. The UV-assisted cure removes the organic template promoting organic functionalization and silanol condensation, making the silica-zeolite films more hydrophobic. Moreover, the zeolite material is also mechanically stronger and crack-free. The method can be used to prepare pure-silica-zeolite films more suitable as low-k materials in semiconductor processing.

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Li et al., Chem. Mater. 2005, 17, 1851-1854.

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