UV curing method and apparatus

Coating processes – Direct application of electrical – magnetic – wave – or... – Polymerization of coating utilizing direct application of...

Reexamination Certificate

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C427S508000, C427S511000, C427S516000, C257S088000, C118S620000, C118S641000

Reexamination Certificate

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10753947

ABSTRACT:
A UV curing apparatus and method is provided for enhancing UV curing of inks, coatings and adhesives having UV photo initiators therein by subjecting the UV curable inks, coatings or adhesives to UV light at different wavelengths. Preferably, the UV LED assemblies are alternated in rows and emit light at a wavelength between 180 nm and 420 nm. A row of UV-LED assemblies which emit light in the visible spectrum can be included so a user can visually see if the apparatus is working. A cooling system can be provided for maintaining the UV-LED assemblies at a desired temperature to maintain light intensity and the UV LED assemblies are placed at a distance from the UV curable product which will provide a uniform pattern of light diverging from the UV-LED chips of at least 50% the power output of the UV-LED chips at a viewing cone angle of 2θ1/2. Still further the apparatus can be combined with an ink, coating or adhesive having photo initiators that are activated by light at more than one wavelength.

REFERENCES:
patent: 4010374 (1977-03-01), Ramler
patent: 4309452 (1982-01-01), Sachs
patent: 4980701 (1990-12-01), Contois et al.
patent: 4990971 (1991-02-01), Le Creff
patent: 5278432 (1994-01-01), Ignatius et al.
patent: 5420768 (1995-05-01), Kennedy
patent: 5535673 (1996-07-01), Bocko et al.
patent: 5634711 (1997-06-01), Kennedy et al.
patent: 5660461 (1997-08-01), Ignatius et al.
patent: 5762867 (1998-06-01), D'Silva
patent: 5764263 (1998-06-01), Lin
patent: 5857767 (1999-01-01), Hochstein
patent: 5986682 (1999-11-01), Itou
patent: 6075595 (2000-06-01), Malinen
patent: 6092890 (2000-07-01), Wen et al.
patent: 6112037 (2000-08-01), Nagata et al.
patent: 6145979 (2000-11-01), Caiger et al.
patent: 6163036 (2000-12-01), Taninaka et al.
patent: 6188086 (2001-02-01), Masuda et al.
patent: 6200134 (2001-03-01), Kovac et al.
patent: 6354700 (2002-03-01), Roth
patent: 6425663 (2002-07-01), Eastlund et al.
patent: 6447112 (2002-09-01), Hu et al.
patent: 6457823 (2002-10-01), Cleary et al.
patent: 6498355 (2002-12-01), Harrah et al.
patent: 6525752 (2003-02-01), Vackier et al.
patent: 6536889 (2003-03-01), Biegelsen et al.
patent: 6561640 (2003-05-01), Young
patent: 6630286 (2003-10-01), Kramer
patent: 6671421 (2003-12-01), Ogata et al.
patent: 6683421 (2004-01-01), Kennedy et al.
patent: 6783810 (2004-08-01), Jin et al.
patent: 6880954 (2005-04-01), Ollett et al.
patent: 7080900 (2006-07-01), Takabayashi et al.
patent: 7137696 (2006-11-01), Siegel
patent: 2001/0030866 (2001-10-01), Hochestein
patent: 2001/0032985 (2001-10-01), Bhat et al.
patent: 2001/0046652 (2001-11-01), Ostler et al.
patent: 2001/0048814 (2001-12-01), Lenmann et al.
patent: 2001/0052920 (2001-12-01), Matsumoto et al.
patent: 2002/0016378 (2002-02-01), Jin et al.
patent: 2002/0044188 (2002-04-01), Codos
patent: 2002/0074554 (2002-06-01), Sweatt et al.
patent: 2002/0074559 (2002-06-01), Dowling et al.
patent: 2002/0149660 (2002-10-01), Cleary et al.
patent: 2002/0175299 (2002-11-01), Kanie et al.
patent: 2003/0218880 (2003-11-01), Brukilacchio
patent: 2004/0011457 (2004-01-01), Kobayashi et al.
patent: 2004/0090794 (2004-05-01), Ollett et al.
patent: 2004/0134603 (2004-07-01), Kobayashi et al.
patent: 2004/0156130 (2004-08-01), Powell et al.
patent: 2005/0104946 (2005-05-01), Siegel
patent: 2005/0152146 (2005-07-01), Owen et al.
patent: 2005/0222295 (2005-10-01), Siegel
patent: 2006/0192829 (2006-08-01), Mills et al.
patent: 2006/0230969 (2006-10-01), Vosahlo
patent: 2006/0237658 (2006-10-01), Waluszko
patent: 2006/0245187 (2006-11-01), Scott et al.
patent: 9912437.2 (1999-05-01), None
patent: 2350321 (2000-11-01), None
patent: 0215168.6 (2002-07-01), None
patent: 0229825.5 (2002-12-01), None
patent: 2390332 (2004-01-01), None
patent: 2396331 (2004-06-01), None
patent: 60-126830 (1985-07-01), None
patent: 2000-268416 (2000-09-01), None
patent: 2001-209980 (2001-08-01), None
patent: 2005-129662 (2005-05-01), None
patent: PCT/GB2003/002834 (2003-07-01), None
patent: PCT/US2003/023504 (2003-07-01), None
patent: WO 2004/002746 (2004-01-01), None
patent: WO 2004/011848 (2004-02-01), None
S.P.Pappas, ed., UV Curing: Science and Technology, Tech. Marketing Corp., Stamford, Conn., USA, excerpts, p. 1 & 101, 1978, no month.
Publication: PCT International Search Report and Written Opinion of International Searching Authority, mailed on Feb. 11, 2005 for International Application No. PCT/US04/21655, International Filing Date Jul. 7, 2004 for Applicant, Con-Trol-Cure, Inc.
Publication: “Photoinitiators for UV Curing Key Products Selection Guide, Coating Effects”, by Ciba Specialty Chemicals, Edition 2003, Switzerland, no month.
Publication: “Photoinitiators for UV Curing Formulators' Guide for Coatings, Additives”, by Ciba Specialty Chemicals, Edition 2001, Switzerland, no month.
Publication: “Optical Properties of Si-Doped AlxGa1-xN/AlyGa1-yN(x=0.24-0.53, y=0.11)Multi-Quantum-Well Structures” by H. Hirayama and Y. Aoyagi, The Institute of Physical and Chemical Research, Saitama, Japan, MRS Internet J. Nitride Semicond. Res. 4S1,G3.74 (1999), no month.

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