Utilization of baffles in chlorination zone for continuous...

Details Utilization of baffles in chlorination zone for continuous... Utilization of baffles in chlorination zone for continuous...

2011-07-26

2011-07-26

Griffin, Walter D (Department: 1774)

Chemical apparatus and process disinfecting, deodorizing, preser

Chemical reactor

Including internal mixing or stirring means

C422S211000, C422S220000, C422S223000, C208S140000

Reexamination Certificate

active

07985381

ABSTRACT:
Catalyst regeneration vessels including a chlorination zone that includes an outer mixing chamber, an inner mixing chamber, and a catalyst bed. The outer mixing chamber can include a lower portion and an upper portion, the lower portion of the outer mixing chamber including at least one air nozzle that injects a drying air stream into the outer mixing chamber, at least one chlorine input nozzle that injects a chlorine input stream into the outer mixing chamber, and at least a first baffle. The chlorination zone can also contain a second baffle that directs the mixed drying air stream and chlorine input stream from the outer mixing chamber to the inner mixing chamber.

REFERENCES:
patent: 5397458 (1995-03-01), Micklich et al.
patent: 5498756 (1996-03-01), Micklich et al.
patent: 5882610 (1999-03-01), Darmancier et al.
patent: 6059961 (2000-05-01), Koves et al.
patent: 6093373 (2000-07-01), Darmancier et al.
patent: 6569389 (2003-05-01), Koves et al.
patent: 6881391 (2005-04-01), Sechrist
patent: 2001/0055548 (2001-12-01), Harter et al.
patent: 1 274 327 (1972-05-01), None

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