Using supercritical fluids to clean lenses and monitor defects

Details Using supercritical fluids to clean lenses and monitor defects Using supercritical fluids to clean lenses and monitor defects

2007-01-02

2007-01-02

Nguyen, Kiet T. (Department: 2881)

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

C355S053000, C355S030000

Reexamination Certificate

active

10978844

ABSTRACT:
Disclosed are immersion lithography methods involving irradiating a first photoresist through a lens and an immersion liquid, the immersion liquid contacting the lens and the first photoresist in a first apparatus; contacting the lens with a supercritical fluid in a second apparatus; and irradiating a second photoresist through the lens and an immersion liquid, the immersion liquid contacting the lens and the second photoresist in the first apparatus.

REFERENCES:
patent: 5879866 (1999-03-01), Starikov et al.
patent: 5900354 (1999-05-01), Batchelder
patent: 6309809 (2001-10-01), Starikov
patent: 6781670 (2004-08-01), Krautschik
patent: 6788477 (2004-09-01), Lin
patent: 6809794 (2004-10-01), Sewell
patent: 2002/0163629 (2002-11-01), Switkes et al.
patent: 2005/0205108 (2005-09-01), Chang et al.
patent: 2006/0001851 (2006-01-01), Grant et al.
patent: 2006/0028628 (2006-02-01), Lin et al.

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