Using high-k dielectrics in isolation structures method,...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Charge transfer device

Reexamination Certificate

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C257S291000, C257S292000

Reexamination Certificate

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07148525

ABSTRACT:
An imager device that has an isolation structure such that pinned photodiode characteristics are maintained without increasing doping levels. The invention provides an isolation structure to maintain pinned photodiode characteristics without increasing doping levels around the photodiode. By creating a substrate region surrounding the charge-collection region of the photodiode, the photodiode may be electrically isolated from the bulk substrate. This region fixes the depletion region so that it does not migrate toward the surface of the substrate or the STI region. By doing so, the region prevents charge from being depleted from the substrate and the accumulation region, reducing dark current.

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“Breakdown and generation of interface states in oxynitride thin films on silicon” by Novkovski, Semiconductor Science and Technology 17 No. 2, Jan. 10, 2002, pp. 93-96.

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