Using deuterated source gases to fabricate low loss GeSiON...

Details Using deuterated source gases to fabricate low loss GeSiON... Using deuterated source gases to fabricate low loss GeSiON...

2006-02-07

2006-02-07

Hyeon, Hae Moon (Department: 2839)

Optical waveguides

Planar optical waveguide

C385S130000

Reexamination Certificate

active

06996320

ABSTRACT:
The present invention provides a method of manufacturing optical devices which includes the steps of providing a substrate and forming at least one optical layer on the substrate. The optical layer is formed by a chemical vapor deposition (CVD) process which includes a deuterated source gas. The present invention also provides an optical device which includes a substrate and an optical layer including deuterium.

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