Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1992-12-29
1997-03-25
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430191, 430192, 430193, 528138, 528141, 528145, 528146, G03F 7023, C08G 804
Patent
active
056143494
ABSTRACT:
The present invention provides methods for producing water insoluble, aqueous alkali soluble novolak resins having a precise and consistent molecular weight, by adjusting the concentration of Lewis base. A method is also provided for producing photoresist composition from such novolak resins and for producing semiconductor devices using such photoresist compositions.
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patent: 5476750 (1995-12-01), Rahman et al.
Jp,A, 04 065 415 Hitachi Chemical Co., Ltd. (See Abstract) (C-952) (5312) & Patent Abstracts of Japan, vol. 16, Jun. 17, 1992 No. 269 (C-952) (5312).
Aubin Daniel P.
Dammel Ralph R.
Durham Dana L.
Rahman M. Dalil
Chu John S.
Hoechst Celanese Corporation
Sayko Jr. Andrew F.
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