Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1991-12-26
1994-06-21
Nguyen, Nam
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
20429826, 20429819, 2042982, C23C 1434
Patent
active
053226062
ABSTRACT:
A cold welding system in which a dual sputtering device is carried on a rotatable arm and is rotated into a coating position between two stationary aligned substrates on a press and simultaneously coats both substrates and then is rotated out of the coating position so the coated substrates can be pressed together. A pair of shutters are pivotably connected to the rotatable arm and can be pivoted from a sputtered blocking position, where the shutters block sputtering in a direction towards the substrates, to a sputterer operating position where the shutters permit sputtering towards the substrates.
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McBain Nola M.
Nguyen Nam
Xerox Corporation
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