Use of particular mixtures of ethyl lactate and methyl ethyl ket

Compositions – Solvents

Patent

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Details

524317, 524364, 430331, B01F 100

Patent

active

051512190

ABSTRACT:
A process for removing unwanted photoresist material from the peripheral areas of a photoresist substrate comprising the steps of:

REFERENCES:
patent: 4746558 (1988-05-01), Shimozawa et al.

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